Hafnium Tetrachloride | HFCL4 Powder | CAS 13499-05-3 | qiimaha warshad

Sharraxaadda Gaaban:

Hafnium tetrachloride waxay leedahay codsiyo muhiim ah oo ah soo noqnoqoshada Hafniim Oxide, Rugta Feejigga ah ee isku-darka dabiiciga ah, codsiyada nukliyeerka, iyo hantida filimka nukliyeerka, iyo muhiimadda ay ku leeyihiin beeraha farsamada kala duwan ee farsamada.

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Calaamadaha wax soo saarka

Sharraxaadda Wax soo saarka

Hordhac kooban

Magaca wax soo saarka: hafnium trachloride
Cas Maya.: 13499-05-3
Qaaciddada xarunta: hfcl4
Miisaanka Moleculal: 320.3
Muuqaalka: budada cad

Cayimid

Wax	Cayimid
Muuqashada	Budada cad
Hfcl4 + zrcl4	≥99.9%
Zr	≤200ppm
Fe	≤40ppm
Ti	20ppm
Si	≤40ppm
Mg	20ppm
Cr	20ppm
Ni	≤25ppm
U	≤5ppm
Al	≤60ppm

Isticmaal

Hafnium dioxide dioxide: Hafnium tetrachloride is primarily used as a precursor to produce hafnium dioxide (HfO2), a material with excellent dielectric properties. HFO2 waxaa si weyn loogu isticmaalaa codsiyada-K Dielecticric-ka ee loo yaqaan 'Transport' iyo xayiraadda ee warshadaha semiconductor. HFCL4 waxay muhiim u tahay soo saarista aaladaha elektiroonigga ah ee horumarsan sababtuna tahay awooda ay u leedahay inay sameyso filimaanta khafiifka ah ee Hafniium Dioxide.
Isku-darka isku-dhafka dabiiciga ah: Hafnium tetrachloride can be used as a catalyst for various organic synthesis reactions, especially olefin polymerization. Qoraalkeeda Lewis acid waxay ka caawisaa sameynta iskudhaf firfircoon, sidaasna ay u hagaajiso hufnaanta hufnaanta fal-celinta kiimikaad. Codsigan wuxuu qiimo u leeyahay soo saarista pomoomers iyo xeryahooda kale ee dabiiciga ah ee ku jira warshadaha kiimikada.
Codsiga Nuclear: Qeybta ka soo baxsanaanta sare ee nafaqo-galka ah, Tetrachloride-ka ee Houutroron, TETNIchloride waxaa si weyn loogu isticmaalaa codsiyada nukliyeerka, gaar ahaan ulaha xakameynta dib-u-celinta nukliyeerka. Hafnium waxay si wax ku ool ah u nuugi kartaa neutrons, sidaa darteed waa qalab ku habboon oo lagu habeeyo hanaanka qaddarka, kaas oo ka caawiya hagaajinta amniga iyo hufnaanta jiil nukliyeerka ah.
Dejisida Filimka Fudud: Hafnium tetrachloride is used in chemical vapor deposition (CVD) processes to form thin films of hafnium-based materials. Filimaantani waxay muhiim u yihiin codsiyo kaladuwan oo kala duwan, oo ay ku jiraan microuelektonic, optics, iyo jaakad ilaalin ah. Awoodda lagu keydiyo labis, filim tayo sare leh ayaa ka dhigaya hfcl4 qiimo leh hanaannada wax soo saarka ee horumarsan.