Codsiga eehafnium tetrachloride(HfCl₄) ee wax soo saarka semiconductor waxaa inta badan diiradda saaraya diyaarinta maaddooyinka joogtada ah dielectric sare (sare-k) iyo kaydinta uumiga kiimikada (CVD) hababka. Kuwa soo socda waa codsiyadooda gaarka ah:
Diyaarinta walxaha joogtada ah ee dielectric sare
Asalkii hore: Iyadoo horumarinta tignoolajiyada semiconductor, cabbirka transistor-ka ayaa sii yaraanaya, iyo lakabka daboolka albaabka ee silicon dioxide (SiO₂) ayaa si tartiib tartiib ah u awoodin inuu daboolo baahiyaha aaladaha wax-qabadka sare leh ee semiconductor sababtoo ah dhibaatooyinka qulqulka. Qalabka joogtada ah ee dielectric High si weyn u kordhin kara cufnaanta capacitance ee transistor-yada, taas oo hagaajinaysa waxqabadka qalabka.
Codsiga: Hafnium tetrachloride waa horudhac muhiim ah oo loogu talagalay diyaarinta walxaha-k sare (sida hafnium dioxide, HfO₂). Inta lagu jiro habka diyaarinta, hafnium tetrachloride waxaa loo beddelaa filimaanta hafnium dioxide iyada oo loo marayo falcelinta kiimikada. Filimadani waxay leeyihiin sifooyin dielectric ah oo aad u fiican waxaana loo isticmaali karaa lakabyada dahaarka albaabka ee transistors. Tusaale ahaan, meel dhigista gate dielectric HfO₂ ee MOSFET (birta-oxide-semiconductor field-effect transistor), hafnium tetrachloride waxaa loo isticmaali karaa gaaska hordhaca ah ee hafnium.
Habka Kaydinta Uumiga Kiimikada (CVD).
Background: Dhigista uumiga kiimikaad waa tignoolajiyada kaydinta filimada khafiifka ah oo si weyn loogu isticmaalo soo saarista semiconductor, kaas oo sameeya filim dhuuban oo siman dushiisa substrate-ka iyada oo loo marayo falcelin kiimikaad.
Codsiga: Hafnium tetrachloride waxaa loo isticmaalaa horudhac ahaan habka CVD si loo dhigo hafnium bir ah ama filimada isku dhafka ah ee hafnium. Filimadani waxay leeyihiin noocyo kala duwan oo loo isticmaalo qalabka semiconductor, sida soo saarista transistor-yada waxqabadka sare leh, xusuusta, iwm. Tusaale ahaan, qaar ka mid ah hababka wax soo saarka semiconductor sare, hafnium tetrachloride waxaa lagu kaydiyaa dusha sare ee wafer silikoon iyada oo loo marayo habka CVD si loo sameeyo filim tayo sare leh oo ku salaysan hafnium, kuwaas oo loo isticmaalo si loo hagaajiyo waxqabadka korantada ee qalabka.
Ahmiyada Tignoolajiyada Sifaynta
Asal-ka-dhac: Wax-soo-saarka semiconductor, nadiifinta maaddadu waxay saameyn muhiim ah ku leedahay waxqabadka aaladda. Nadiifinta sare ee hafnium tetrachloride waxay xaqiijin kartaa tayada iyo waxqabadka filimka la dhigay.
Codsiga: Si loo buuxiyo shuruudaha wax-soo-saarka chip-dhamaadka sare, nadiifnimada hafnium tetrachloride sida caadiga ah waxay u baahan tahay inay gaarto in ka badan 99.999%. Tusaale ahaan, Jiangsu Nanda Optoelectronic Materials Co., Ltd. waxay heshay shati loogu talagalay diyaarinta semiconductor-fasalka hafnium tetrachloride, taas oo adeegsata habka sublimation decompression sare-vacuum si loo nadiifiyo hafnium tetrachloride adag si loo hubiyo in nadiifinta hafnium tetrachloride la soo ururiyey ay gaadho in ka badan 99.9999%. Nadiifinta sare ee hafnium tetrachloride waxay si fiican u buuxin kartaa shuruudaha farsamada habka 14nm.
Codsiga hafnium tetrachloride ee wax soo saarka semiconductor kaliya ma kor u qaado hagaajinta waxqabadka qalabka semiconductor, laakiin sidoo kale waxay bixisaa saldhig qalab muhiim ah horumarinta tignoolajiyada sare ee semiconductor mustaqbalka. Iyadoo horumarinta joogtada ah ee tignoolajiyada wax soo saarka semiconductor, shuruudaha nadiifinta iyo tayada hafnium tetrachloride waxay noqon doontaa mid sare iyo mid sare, taas oo sii kordhin doonta horumarinta tignoolajiyada nadiifinta ee la xidhiidha.
| Magaca Alaabta | Hafnium tetrachloride |
| CAS | 13499-05-3 |
| Foomamka isku dhafka ah | HfCl4 |
| Miisaanka Molecular | 320.3 |
| Muuqashada | budo cad |
Sidee bay nadiifinta hafnium tetrachloride u saamaysaa aaladaha semiconductor?
Nadiifinta hafnium tetrachloride (HfCl₄) waxay saameyn aad u muhiim ah ku leedahay waxqabadka iyo isku halaynta aaladaha semiconductor. Wax soo saarka semiconductor, hafnium tetrachloride-nadiifinta sare waa mid ka mid ah qodobbada muhiimka ah ee lagu hubinayo waxqabadka qalabka iyo tayada. Kuwa soo socda ayaa ah saamaynta gaarka ah ee hafnium tetrachloride nadiifnimada aaladaha semiconductor:
1. Saamaynta tayada iyo waxqabadka filimada khafiifka ah
Midnimada iyo cufnaanta filimada khafiifka ah: Nadiifinta sare ee hafnium tetrachloride waxay samayn kartaa labbis iyo filimaan cufan inta lagu jiro kaydinta uumiga kiimikada (CVD). Haddii hafnium tetrachloride ay ka kooban tahay wasakh, wasakhdaas waxaa laga yaabaa inay sameeyaan cillado ama godadka inta lagu jiro habka dhigista, taasoo keentay hoos u dhaca isku midka ah iyo cufnaanta filimka. Tusaale ahaan, wasakhdu waxay sababi kartaa dhumucda filimka oo aan sinnayn, taasoo saamaynaysa waxqabadka korantada ee qalabka.
Qalabka dielectric ee filimada khafiifka ah: Marka la diyaarinayo walxaha joogtada ah ee dielectric sare (sida hafnium dioxide, HfO₂), daahirsanaanta hafnium tetrachloride si toos ah u saameeya sifooyinka dielectric ee filimka. Nadiifinta sare ee hafnium tetrachloride waxay hubin kartaa in filimka hafnium dioxide ee la kaydiyay uu leeyahay dielectric joogto ah oo joogto ah, dareere hoose oo hadda jira iyo sifooyin dahsoon oo wanaagsan. Haddii hafnium tetrachloride ay ka kooban tahay wasakh bir ah ama wasakh kale, waxaa laga yaabaa inay soo bandhigto dabinno lacag-bixineed oo dheeri ah, waxay kordhisaa qulqulka hadda, waxayna yaraynaysaa sifooyinka tamarta ee filimka.
2. Saamaynta sifooyinka korantada ee qalabka
Joogitaanka dareeraha: Markasta oo ay sareeyso nadiifnimada hafnium tetrachloride, ayaa sii saafi ah filimka la shubay, iyo waxa sii yaraanaya qulqulka qulqulka. Baaxadda daadinta hadda waxay si toos ah u saamaysaa isticmaalka tamarta iyo waxqabadka aaladaha semiconductor. Nadiifinta sare ee hafnium tetrachloride waxay si weyn u yarayn kartaa qulqulka hadda jira, taas oo hagaajinaysa waxtarka tamarta iyo waxqabadka aaladda.
Korantada burburka: Joogitaanka wasakhdu waxay yarayn kartaa danab burburka filimka, taasoo keenaysa in aaladda ay si fudud u dhaawacdo marka la eego danab sare. Nadiifinta sare ee hafnium tetrachloride waxay kordhin kartaa danab burburka filimka waxayna kor u qaadi kartaa kalsoonida aaladda.
3. Saamaynta isku halaynta iyo nolosha aaladda
Deganaanshaha kulaylka: Nadiifinta sare ee hafnium tetrachloride waxay ilaalin kartaa xasilloonida kulaylka wanaagsan ee jawi heerkul sare ah, iyada oo laga fogaanayo kuleylka kuleylka ama isbeddelka wejiga ee ay keento wasakhda. Tani waxay gacan ka geysaneysaa hagaajinta xasilloonida iyo nolosha qalabka ee heerkulka sare ee xaaladaha shaqada.
Degganaanshaha kiimikaad: Wasakhda ayaa laga yaabaa inay si kiimiko ah ula falgalaan walxaha ku xeeran, taasoo keenta hoos u dhaca xasiloonida kiimikada ee aaladda. Nadiifinta sare ee hafnium tetrachloride waxay yarayn kartaa dhacdada fal-celinta kiimikada, taas oo hagaajinaysa kalsoonida iyo nolosha qalabka.
4. Saamaynta wax soo saarka qalabka
Iska yaree cilladaha: Nadiifinta sare ee hafnium tetrachloride waxay yarayn kartaa cilladaha habka dhigista waxayna wanaajisaa tayada filimka. Tani waxay gacan ka geysaneysaa hagaajinta wax soo saarka qalabka semiconductor iyo dhimista kharashka wax soo saarka.
Hagaajinta joogtaynta: Nadiifinta sare ee hafnium tetrachloride waxay hubin kartaa in qaybaha kala duwan ee filimadu ay leeyihiin waxqabad joogto ah, taas oo muhiim u ah wax soo saarka baaxadda weyn ee aaladaha semiconductor.
5. Saamaynta hababka horumarsan
Buuxi shuruudaha geeddi-socodyada horumarsan: Iyada oo hababka wax-soo-saarka semiconductor ay sii wadaan inay u horumaraan geeddi-socodyada yaryar, shuruudaha nadiifinta agabku sidoo kale way sii kordhayaan oo sarreeyaan. Tusaale ahaan, aaladaha semiconductor ee leh habka 14nm iyo ka hooseeya inta badan waxay u baahan yihiin daahirnimo hafnium tetrachloride oo ka badan 99.999%. Nadiifinta sare ee hafnium tetrachloride waxay buuxin kartaa shuruudaha walxaha adag ee hababkan horumarsan waxayna hubisaa waxqabadka aaladaha marka loo eego waxqabadka sare, isticmaalka tamarta yar iyo kalsoonida sare.
Kor u qaadida horumarka tignoolajiyada: Nadiifinta sare ee hafnium tetrachloride kaliya ma dabooli karto baahiyaha hadda jira ee wax soo saarka semiconductor, laakiin sidoo kale waxay bixisaa aasaas agab muhiim u ah horumarinta tignoolajiyada sare ee semiconductor mustaqbalka.
Nadiifinta hafnium tetrachloride waxay saameyn muhiim ah ku leedahay waxqabadka, isku halaynta iyo nolosha aaladaha semiconductor. Nadiifinta sare ee hafnium tetrachloride waxay hubin kartaa tayada iyo waxqabadka filimka, waxay yaraynaysaa qulqulka hadda jira, kordhinta korantada burburka, kor u qaadida xasiloonida kulaylka iyo xasiloonida kiimikada, taas oo hagaajinaysa waxqabadka guud iyo isku halaynta aaladaha semiconductor. Iyadoo horumarinta joogtada ah ee tignoolajiyada wax soo saarka semiconductor, shuruudaha nadiifinta hafnium tetrachloride waxay noqon doontaa mid sare iyo mid sare, taas oo sii kordhin doonta horumarinta tignoolajiyada nadiifinta ee la xidhiidha.
Waqtiga boostada: Abriil-22-2025